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Lanthanum aluminum oxide LaAlO3 Single Crystal Substrates

Lanthanum aluminate (LaAlO3) single crystal is currently the most industrialized, large-size superconducting thin film substrate single crystal material. Check with us " sales@boyanoptical.com " with below details for quotation : 1. Orientation 2. Size 3.Polishing request : SSP or DSP 4.Quantity

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Product Details:

Lanthanum aluminum oxide LaAlO3 Single Crystal Substrates

Lanthanum aluminate (LaAlO3) single crystal is currently the most industrialized, large-size superconducting thin film substrate single crystal material. It uses the Czochralski method to grow single crystals and substrates with diameters of 2 inches and larger. It has good lattice matching with high-temperature superconducting materials such as YBaCuO, poor dielectric, and small microwave loss, so it is sufficient to produce high-temperature superconducting microwave electronic devices (such as high-temperature superconducting microwave oscillators in remote communications, etc.). Huge practical and potential application prospects.

Material   
Crystal Structure Hexagonal(room temperature ) Cubic
Lattice constant a=5.357Å b=13.22Å a=3.281Å 
Coefficient of thermal expansion 9.4x10-6/°C
Growth method Czochralski method
Density 6.52(g.cm3)
Melting  Point 2080
Hardness 6-6.5(mohs)
Loss tangent (10ghz) ~3x10-4@300k,~0.6x10-4@77k
Dielectric Constant 21
Color and Appearance It varies depending on the annealing conditions, from brown to brown
Polished substrates have naturally twinned domains
Chemical stability Insoluble in mineral acid at room temperature, soluble in h3po4 when the temperature is greater than 150°C
Application Suitable for microwave electronic devices
Surface:  One Side Polished Both Side Polished
Orientation <100>+/-0.5degree <110>+/-0.5degree <111>+/-0.5degree
Edge orientation accuracy: 2° (special requirements can reach within 1°)
Bevel cut wafer According to specific needs, we can process wafers whose edge-oriented crystal planes are tilted at a specific angle (tilt angle 1°-45°)
Ra: ≤5Å(5µm×5µm)
Standard Size 5x5mm,10x10mm,10x5mm,15x15mm,20x20mm,dia 25.4mm,dia 50.8mm
Thickness 0.5mm
1.0mm
Or other thickness requested

1. Features:

- Superior Lanthanum aluminum oxide LaAlO3 single crystal substrates

- Enhances semiconductor device fabrication

- Precision and reliability like never before

- High-quality performance

 

2. Applicable Groups:

- Semiconductor manufacturers

- Research and development laboratories

- Technology companies

 

3. Applicable Scenarios:

- Integrated circuit production

- Nanotechnology research

- Semiconductor device testing

 

4. Cost Performance:

- Competitive pricing for premium quality

- Long-lasting durability

- Cost-effective solution for high-performance requirements

 

Enhance your semiconductor device fabrication with our superior Lanthanum aluminum oxide LaAlO3 single crystal substrates. Experience precision and reliability like never before. Our substrates are specifically designed for semiconductor manufacturers, research and development laboratories, and technology companies seeking high-quality performance at competitive prices. Perfect for integrated circuit production, nanotechnology research, and semiconductor device testing, our substrates offer long-lasting durability and cost-effective solutions for all your high-performance requirements. Order now to elevate your semiconductor manufacturing process to new heights.

Lanthanum aluminum oxide (LaAlO3) single crystal substrates are high-quality materials that are widely used in various technological applications. LaAlO3 is a well-known perovskite material with excellent electrical, optical, and mechanical properties, making it an ideal choice for use in a wide range of applications.

One of the primary applications of LaAlO3 single crystal substrates is in the field of thin film growth. These substrates have a smooth surface with a low defect density, making them suitable for growing high-quality thin films with excellent structural and electrical properties. LaAlO3 single crystal substrates are commonly used as a template for the epitaxial growth of complex oxide thin films, such as high-temperature superconductors, ferroelectric materials, and magnetic materials. The high-quality crystal structure of LaAlO3 substrates provides a stable and uniform surface for thin film deposition, resulting in films with improved properties and performance.

In addition to thin film growth, LaAlO3 single crystal substrates are also used in the production of electronic devices, such as field-effect transistors, sensors, and capacitors. The electrical properties of LaAlO3, including its high dielectric constant and low dielectric loss, make it an excellent material for use in electronic devices that require high-performance insulating layers. The crystal structure of LaAlO3 provides a stable platform for the fabrication of electronic devices with precise control over the device properties and performance.

Furthermore, LaAlO3 single crystal substrates are also employed in the development of optical devices, such as waveguides, filters, and sensors. The optical properties of LaAlO3, including its high transparency in the visible and near-infrared regions, make it a suitable material for use in optical applications. LaAlO3 single crystal substrates can be used as a substrate for the growth of thin films with specific optical properties, enabling the fabrication of optical devices with tailored functionalities.

Moreover, LaAlO3 single crystal substrates find applications in the field of solid-state batteries, fuel cells, and other energy storage and conversion devices. The high-temperature stability and chemical inertness of LaAlO3 make it an ideal material for use in harsh environments, such as those encountered in energy storage and conversion applications. LaAlO3 substrates can be used as a platform for the fabrication of electrodes, electrolytes, and other components of energy storage and conversion devices, allowing for the development of high-performance and long-lasting devices.

Overall, Lanthanum aluminum oxide (LaAlO3) single crystal substrates are versatile materials that find applications in a wide range of technological fields, including thin film growth, electronics, optics, energy storage, and conversion. The excellent properties of LaAlO3, such as its high electrical, optical, and mechanical characteristics, make it a valuable material for use in high-performance devices and systems. Researchers and engineers continue to explore new applications and innovative uses for LaAlO3 single crystal substrates, further expanding the potential of this versatile material in various technological fields.

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